Crystallography
From precision crystal growth to atomic-scale characterization: Advanced X-ray diffraction and in-situ surface microscopy
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The Crystallography facility provides a comprehensive infrastructure for the synthesis and structural analysis of single crystals, polycrystalline materials, and thin films. By combining diverse crystal growth techniques—including Czochralski, hydrothermal, and traveling heater methods—with high-resolution X-ray diffraction and specialized Hydrothermal AFM, we enable the investigation of phase identities, microstructures, and surface dynamics under controlled environmental conditions.
X-ray diffraction
- Rooms
- C 220, C 221, C 227
- Responsible
- SoHyun Park, Giacomo Criniti
- Access regulations
- by prior appointment
- Application
- High-resolution diffraction data of single crystal, fine-crystalline, amorphous, and thin-film samples are provided for phase identification and quantitative phase analysis, as well as atomic and microstructure analysis.
Atomic Force Microscopy (AFM)
- Room
- C 217
- Contact Person
- Guntram Jordan
- Access regulations
- by arrangement
- Application
- Two atomic force microscopes are available, a JPK-NanoWizard II and a Hydrothermal AFM (HAFM). The NanoWizard allows in-situ high resolution microscopy of the topography of surfaces in air or aqueous solutions. The microscope is equipped with a heating-cooling stage enabling measurement between about 0 and 30 °C. The HAFM has a pressure fluid cell which allows in-situ measurements at temperatures up to 125 °C.
Crystal growth laboratory
- room
- C 224
- Contact
- Elena Sturm
- Facilities
- Czochralski crystal growth equipment (high vacuum)
High-frequency generator (6 kW clamping power)
High vacuum pump stand (oil diffusion pump) with gas inlet option for H2, Ar (5.0), and N2 (5.0) for material preparation Various high vacuum pump stands
2 high-pressure autoclaves for single crystal growth under hydrothermal conditions with dual-zone heating and temperature program control
Several single-zone and dual-zone furnaces for crystal growth in silica glass vessels
Tempering furnaces (up to 1600°C) with temperature program controllers Various single-zone and multi-zone furnaces with temperature program controllers (synthesis and crystal growth)
Vertical THM crucible heating apparatus (traveling heater method), equipped for accelerated crucible rotation technology (ACRT)
Heating cabinets with temperature programmers for cultivation from aqueous solutions (cooling method)
Multi-chamber immersion thermostat for cultivation from aqueous solutions (evaporation method) - Additional equipment
- Crystal saws (diamond wire saw, spark erosion saw, wire lapping saw)
Grinding and polishing equipment for mechanical surface preparation
Low-pressure autoclaves for synthesis under hydrothermal conditions
© Lina Seybold LMU
The crystal growth laboratory enables the controlled production of high-quality single crystals using a wide range of physical and chemical processes. In this research facility, materials can be obtained from the melt as well as from gaseous or liquid phases. The technological spectrum ranges from the classic Czochralski method in high vacuum to chemical synthesis in autoclaves under hydrothermal conditions to precise growth from aqueous solutions.
The use of specialized furnace technology and variable gas environments allows complex material preparations and thermal post-treatments to be carried out at temperatures of up to 1600°C. Special processes such as the traveling heater method with accelerated crucible rotation also allow the crystal quality to be specifically influenced during the growth process. Beyond pure growth, the laboratory offers the complete process chain of sample preparation. This includes high-precision sawing of crystals using spark erosion or diamond wire, as well as mechanical surface treatment by grinding and polishing to prepare the samples for subsequent physical examinations or technical applications.